Crystal morphology evolution in film growth : A general approach

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)86-96
Journal / PublicationJournal of Crystal Growth
Volume296
Issue number1
Online published26 Sep 2006
Publication statusPublished - 15 Oct 2006
Externally publishedYes

Abstract

Most crystal growth processes involve many competing mechanisms, all of which can affect the observed morphology evolution. This paper provides a framework for understanding growth competition and determining which mechanisms dominate the morphology under different conditions. The approach is based upon the development of a generalized growth law combined with asymptotic analysis. Next, we show how this model unifies many of the physical processes that are known to be of importance in film growth. Next, we provide a graph theoretic method for analyzing growth competition and identifying the morphology-determining processes and parameters. As an example, we apply the present approach to the case of metalorganic chemical vapor deposition of GaN. Finally, we examine how the mechanisms that control morphology evolution change as the crystal grows larger.

Research Area(s)

  • A1. Crystal morphology, A1. Diffusion, A1. Growth models, A1. Interfaces, A3. Metalorganic chemical vapor deposition