Co-sputtered oxide thin film encapsulated organic electronic devices with prolonged lifetime

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

6 Scopus Citations
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Author(s)

  • F. L. Wong
  • M. K. Fung
  • C. Y. Ng
  • A. Ng
  • I. Bello
  • S. T. Lee

Detail(s)

Original languageEnglish
Pages (from-to)1131-1135
Journal / PublicationThin Solid Films
Volume520
Issue number3
Publication statusPublished - 30 Nov 2011

Abstract

Effective top-side thin film encapsulation for organic light-emitting devices (OLEDs) was achieved by deposition of a multi-layer water diffusion barrier stack to protect the device against moisture permeation. The barrier stack was formed by alternative depositions of co-oxide and fluorocarbon (CFx) films. The co-oxide layer was fabricated by magnetron co-sputtering of silicon dioxide (SiO2) and aluminum oxide (Al 2O3). While the CFx layer was formed by plasma enhanced chemical vapor deposition. The water vapor transmission rate of the optimized diffusion barrier stack can be down to 10-6 g/m 2/day. The OLEDs encapsulated with the multilayer stack have been shown to have operation lifetime of over 18,000 h which is nearly the same as devices with conventional glass-cover encapsulation. © 2011 Elsevier B.V. All rights reserved.

Research Area(s)

  • Co-sputtering, Encapsulation, Lifetime, Organic

Citation Format(s)

Co-sputtered oxide thin film encapsulated organic electronic devices with prolonged lifetime. / Wong, F. L.; Fung, M. K.; Ng, C. Y.; Ng, A.; Bello, I.; Lee, S. T.; Lee, C. S.

In: Thin Solid Films, Vol. 520, No. 3, 30.11.2011, p. 1131-1135.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review