Corrosion and wear resistance of TiN and Ti-O/TiN films deposited on Ti-6Al-4V using plasma implantation and deposition
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 22_Publication in policy or professional journal
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Journal / Publication | IEEE International Conference on Plasma Science |
| Publication status | Published - 2002 |
Conference
| Title | 2002 IEEE International Conference on plasma Science |
|---|---|
| Place | Canada |
| City | Banff, Alta. |
| Period | 26 - 30 May 2002 |
Link(s)
Abstract
Titanium nitride (TiN) films were deposited on Ti-6Al-4V alloy using PIII-D, followed by oxidation to form Ti-O/TiN films. The corrosion and wear resistance of the films were studied in phosphate buffered solution (PBS). The open-circuit potential versus exposure time (I-t), polarization curves (E-I) and electrochemical impedance spectra (EIS) were obtained.
Citation Format(s)
Corrosion and wear resistance of TiN and Ti-O/TiN films deposited on Ti-6Al-4V using plasma implantation and deposition. / Wang, G. J.; Huang, N.; Leng, Y. X.; Yang, P.; Chen, J. Y.; Wang, J.; Sun, H.; Chu, P. K.
In: IEEE International Conference on Plasma Science, 2002.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 22_Publication in policy or professional journal
