Corrosion and wear resistance of TiN and Ti-O/TiN films deposited on Ti-6Al-4V using plasma implantation and deposition

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

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Author(s)

  • G. J. Wang
  • N. Huang
  • Y. X. Leng
  • P. Yang
  • J. Y. Chen
  • J. Wang
  • H. Sun

Detail(s)

Original languageEnglish
Journal / PublicationIEEE International Conference on Plasma Science
Publication statusPublished - 2002

Conference

Title2002 IEEE International Conference on plasma Science
PlaceCanada
CityBanff, Alta.
Period26 - 30 May 2002

Abstract

Titanium nitride (TiN) films were deposited on Ti-6Al-4V alloy using PIII-D, followed by oxidation to form Ti-O/TiN films. The corrosion and wear resistance of the films were studied in phosphate buffered solution (PBS). The open-circuit potential versus exposure time (I-t), polarization curves (E-I) and electrochemical impedance spectra (EIS) were obtained.

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