Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))

Orb Acton; Guy G. Ting; Patrick J. Shamberger; Fumio S. Ohuchi; Hong Ma; Alex K.-Y. Jen

doi:10.1021/am100914u

Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))

Orb Acton
, Guy G. Ting
, Patrick J. Shamberger
, Fumio S. Ohuchi
, Hong Ma^*
, Alex K.-Y. Jen^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › Erratum

3 Citations (Scopus)

Original language	English
Pages (from-to)	2963
Journal	ACS Applied Materials and Interfaces
Volume	2
Issue number	10
Online published	12 Oct 2010
DOIs	https://doi.org/10.1021/am100914u
Publication status	Published - 27 Oct 2010
Externally published	Yes

Access Output

10.1021/am100914u

Other Access Options

Check CityUHK Library

Permanent Link

Right click to copy link

Cite this

Acton, O., Ting, G. G., Shamberger, P. J., Ohuchi, F. S., Ma, H., & Jen, A. K.-Y. (2010). Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511)). ACS Applied Materials and Interfaces, 2(10), 2963. https://doi.org/10.1021/am100914u

@article{da73c3bab79a472f84d3cca8c5d78c32,

title = "Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))",

author = "Orb Acton and Ting, \{Guy G.\} and Shamberger, \{Patrick J.\} and Ohuchi, \{Fumio S.\} and Hong Ma and Jen, \{Alex K.-Y.\}",

year = "2010",

month = oct,

day = "27",

doi = "10.1021/am100914u",

language = "English",

volume = "2",

pages = "2963",

journal = "ACS Applied Materials and Interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

number = "10",

}

Acton, O, Ting, GG, Shamberger, PJ, Ohuchi, FS, Ma, H & Jen, AK-Y 2010, 'Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))', ACS Applied Materials and Interfaces, vol. 2, no. 10, pp. 2963. https://doi.org/10.1021/am100914u

Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511)). / Acton, Orb; Ting, Guy G.; Shamberger, Patrick J. et al.
In: ACS Applied Materials and Interfaces, Vol. 2, No. 10, 27.10.2010, p. 2963.

Research output: Journal Publications and Reviews › Erratum

TY - JOUR

T1 - Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))

AU - Acton, Orb

AU - Ting, Guy G.

AU - Shamberger, Patrick J.

AU - Ohuchi, Fumio S.

AU - Ma, Hong

AU - Jen, Alex K.-Y.

PY - 2010/10/27

Y1 - 2010/10/27

UR - https://www.scopus.com/pages/publications/79151469494

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-79151469494&origin=recordpage

U2 - 10.1021/am100914u

DO - 10.1021/am100914u

M3 - Erratum

SN - 1944-8244

VL - 2

SP - 2963

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 10

ER -

Correction to Dielectric Surface-Controlled Low-Voltage Organic Transistors via n-Alkyl Phosphonic Acid Self-Assembled Monolayers on High-k Metal Oxide (ACS Applied Materials and Interfaces (2010) 2 (511))

Access Output

Other Access Options

Permanent Link

Other Files and Links

Dielectric surface-controlled low-voltage organic transistors via n-alkyl phosphonic acid self-assembled monolayers on high-k metal oxide

Cite this