Controlled deposition of large-area and highly-ordered thin films : effect of dip-coating-induced morphological evolution on resistive memory performance

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • Yang Li
  • Cheng Zhang
  • Zhuang Li
  • Peiyang Gu
  • Zilong Wang
  • Hua Li
  • Jianmei Lu

Detail(s)

Original languageEnglish
Pages (from-to)3512-3521
Journal / PublicationJournal of Materials Chemistry C
Volume7
Issue number12
Online published20 Feb 2019
Publication statusPublished - 28 Mar 2019
Externally publishedYes

Abstract

Developing a simple, versatile and efficient technique that enables both large-scale production and nano-scale control is highly desirable but very challenging for achieving high-performance organic-based memory electronic devices. Herein, we employed a dip-coating method to fabricate reliable and cost-effective organic memory devices (OMDs). This technique enables us to deposit high-quality, homogeneous and large-area nanopatterns on the surfaces of thin films and realize uniform OMD performances with a record reproducibility up to 96%. To the best of our knowledge, this is the first report on dip-coated OMDs with the highest reproducibility observed to date, which demonstrates the promising versatility of the dip-coating technique to fabricate organic memory devices and its suitability to scale-up for high-throughput solution processing.

Citation Format(s)

Controlled deposition of large-area and highly-ordered thin films : effect of dip-coating-induced morphological evolution on resistive memory performance. / Li, Yang; Zhang, Cheng; Li, Zhuang; Gu, Peiyang; Wang, Zilong; Li, Hua; Lu, Jianmei; Zhang, Qichun.

In: Journal of Materials Chemistry C, Vol. 7, No. 12, 28.03.2019, p. 3512-3521.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal