Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 2316-2322 |
Journal / Publication | Journal of Materials Chemistry C |
Volume | 2 |
Issue number | 13 |
Online published | 16 Jan 2014 |
Publication status | Published - 7 Apr 2014 |
Externally published | Yes |
Link(s)
Abstract
The pattern resolution of soft lithographic techniques is critically determined by the elastic modulus of the soft mold that can support fine and high-aspect-ratio features with conformal adhesion to target substrates. We present a strategy to fine-tune the elastic modulus of conformal molds made of polyurethane acrylate by optimizing the chemical structures and the composition of prepolymer and modulator. Trimethylolpropane ethoxylated (15) triacrylate plays a key role as a delicate modulator for increasing the elastic modulus of soft aliphatic urethane diacrylate oligomer with its low cross-linking density. The optimized molds have sufficiently high elastic modulus (>23 MPa) for defect-free replication of dense, high-aspect-ratio (>2) nanopillars and nanotrench structures while still preserving their conformality. The conformal mold with good mechanical and optical properties can serve as a semi-permanently usable optical phase mask with a wide range of phase modulations for generating three-dimensional (3D) nanostructures with high precision.
Citation Format(s)
Conformal phase masks made of polyurethane acrylate with optimized elastic modulus for 3D nanopatterning. / Park, Junyong; Tahk, Dongha; Ahn, Changui; Im, Sung Gap; Choi, Se-Jin; Suh, Khap-Yang; Jeon, Seokwoo.
In: Journal of Materials Chemistry C, Vol. 2, No. 13, 07.04.2014, p. 2316-2322.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review