Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

Junyong Park; Jae Hong Park; Eunhye Kim; Chi Won Ahn; Hyun Ik Jang; John A. Rogers; Seokwoo Jeon

doi:10.1002/adma.201003885

Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

Junyong Park
, Jae Hong Park
, Eunhye Kim
, Chi Won Ahn
, Hyun Ik Jang
, John A. Rogers
, Seokwoo Jeon^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

76 Citations (Scopus)

Abstract

Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Original language	English
Pages (from-to)	860-864
Journal	Advanced Materials
Volume	23
Issue number	7
DOIs	https://doi.org/10.1002/adma.201003885
Publication status	Published - 15 Feb 2011
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Research Keywords

3D nanopatterning
micropillar arrays
nanostructures
optical coatings
phase masks

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10.1002/adma.201003885

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title = "Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning",

abstract = "Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures. Copyright {\textcopyright} 2011 WILEY-VCH Verlag GmbH \& Co. KGaA, Weinheim.",

keywords = "3D nanopatterning, micropillar arrays, nanostructures, optical coatings, phase masks",

author = "Junyong Park and Park, \{Jae Hong\} and Eunhye Kim and Ahn, \{Chi Won\} and Jang, \{Hyun Ik\} and Rogers, \{John A.\} and Seokwoo Jeon",

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journal = "Advanced Materials",

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T1 - Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

AU - Park, Junyong

AU - Park, Jae Hong

AU - Kim, Eunhye

AU - Ahn, Chi Won

AU - Jang, Hyun Ik

AU - Rogers, John A.

AU - Jeon, Seokwoo

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2011/2/15

Y1 - 2011/2/15

N2 - Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

AB - Defect-free and dense micropillar arrays with a high aspect ratio are replicated from etched Si masters using high-modulus polyurethane acrylate. The newly designed conformable solid-index mask can generate high-resolution 3D nanostructures that can be patterned through proximity field nanopatterning (PnP) in a single exposure step. The superb optical property proves the quality of 3D nanostructures. Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

KW - 3D nanopatterning

KW - micropillar arrays

KW - nanostructures

KW - optical coatings

KW - phase masks

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U2 - 10.1002/adma.201003885

DO - 10.1002/adma.201003885

M3 - RGC 21 - Publication in refereed journal

C2 - 21328480

SN - 0935-9648

VL - 23

SP - 860

EP - 864

JO - Advanced Materials

JF - Advanced Materials

IS - 7

ER -

Conformable solid-index phase masks composed of high-aspect-ratio micropillar arrays and their application to 3D nanopatterning

Abstract

Bibliographical note

Research Keywords

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