Abstract
The use of conducting fluorocarbon coatings (CFx) as an anode buffer layer in organic light-emitting diodes (OLED) was analyzed. The chemical modification of the treated CFx films was studied using x-ray photoelectron spectroscopy (XPS). The resistivity of poorly conducting CF x coatings was found to be decreased from 1010 ω cm to 105 ω cm by Ar ion and near UV irradiation. It was observed that UV treatment created graphitic regions leading to the higher conductivity of the CFx layer, keeping the underlying indium tin oxide (ITO) anode intact. On the other hand, Ar ion bombardment was found to cause damage to the ITO anode that contributed to poor device performance.
Original language | English |
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Pages (from-to) | 4032-4034 |
Journal | Applied Physics Letters |
Volume | 84 |
Issue number | 20 |
DOIs | |
Publication status | Published - 17 May 2004 |