Computed Mean Charge State of a Biased Vacuum Arc Plasma Duct

D. T. Kwok; P. K. Chu; M. M. M. Bilek; I. G. Brown; A. Vizir

Computed Mean Charge State of a Biased Vacuum Arc Plasma Duct

D. T. Kwok
, P. K. Chu
, M. M. M. Bilek
, I. G. Brown
, A. Vizir

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Publication status	Published - Apr 2000
Event	International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2000) - Town and Country Hotel, San Diego, United States Duration: 10 Apr 2000 → 14 Apr 2000

Conference

Conference	International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2000)
Place	United States
City	San Diego
Period	10/04/00 → 14/04/00

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Research Unit(s) information for this publication is provided by the author(s) concerned.

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@conference{78a5918ce8b64be28e62457ccde94fc7,

title = "Computed Mean Charge State of a Biased Vacuum Arc Plasma Duct",

author = "Kwok, \{D. T.\} and Chu, \{P. K.\} and Bilek, \{M. M. M.\} and Brown, \{I. G.\} and A. Vizir",

note = "Research Unit(s) information for this publication is provided by the author(s) concerned.; International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2000)<br/> ; Conference date: 10-04-2000 Through 14-04-2000",

year = "2000",

month = apr,

language = "English",

}

Computed Mean Charge State of a Biased Vacuum Arc Plasma Duct. / Kwok, D. T.; Chu, P. K.; Bilek, M. M. M. et al.
2000. Paper presented at International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2000)
, San Diego, California, United States.

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

TY - CONF

T1 - Computed Mean Charge State of a Biased Vacuum Arc Plasma Duct

AU - Kwok, D. T.

AU - Chu, P. K.

AU - Bilek, M. M. M.

AU - Brown, I. G.

AU - Vizir, A.

N1 - Research Unit(s) information for this publication is provided by the author(s) concerned.

PY - 2000/4

Y1 - 2000/4

M3 - RGC 32 - Refereed conference paper (without host publication)

T2 - International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2000)<br/>

Y2 - 10 April 2000 through 14 April 2000

ER -