Computed electron oscillation inside the duct of a vacuum arc source

T. K. Kwok; T. Zhang; P. K. Chu; M. M. M. Bilek; I. G. Brown

doi:10.1063/1.370103

Computed electron oscillation inside the duct of a vacuum arc source

T. K. Kwok
, T. Zhang
, P. K. Chu^*
, M. M. M. Bilek
, I. G. Brown

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

9 Citations (Scopus)

Abstract

A three-dimensional numerical model has been developed to simulate the motion of electrons inside the duct of a vacuum arc metal source. It is found that electrons will travel back and forth along the center axis inside the duct tube. This phenomenon of electron oscillation can be explained by the combined effects of the electric and magnetic fields. The electron oscillation will increase the charge state of the positive ions and the ions will gain more energy. Due to the influence of electron oscillation, the plasma throughput of the duct will be different from that of a duct under the influence of only the magnetic field. This finding should be taken into account when designing metal arc sources and optimizing their performance. © 1999 American Institute of Physics.

Original language	English
Pages (from-to)	6381-6384
Journal	Journal of Applied Physics
Volume	85
Issue number	9
DOIs	https://doi.org/10.1063/1.370103
Publication status	Published - 1 May 1999

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@article{04c742c735e7453b9f60fb68caefb194,

title = "Computed electron oscillation inside the duct of a vacuum arc source",

abstract = "A three-dimensional numerical model has been developed to simulate the motion of electrons inside the duct of a vacuum arc metal source. It is found that electrons will travel back and forth along the center axis inside the duct tube. This phenomenon of electron oscillation can be explained by the combined effects of the electric and magnetic fields. The electron oscillation will increase the charge state of the positive ions and the ions will gain more energy. Due to the influence of electron oscillation, the plasma throughput of the duct will be different from that of a duct under the influence of only the magnetic field. This finding should be taken into account when designing metal arc sources and optimizing their performance. {\textcopyright} 1999 American Institute of Physics.",

author = "Kwok, \{T. K.\} and T. Zhang and Chu, \{P. K.\} and Bilek, \{M. M. M.\} and Brown, \{I. G.\}",

year = "1999",

month = may,

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doi = "10.1063/1.370103",

language = "English",

volume = "85",

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TY - JOUR

T1 - Computed electron oscillation inside the duct of a vacuum arc source

AU - Kwok, T. K.

AU - Zhang, T.

AU - Chu, P. K.

AU - Bilek, M. M. M.

AU - Brown, I. G.

PY - 1999/5/1

Y1 - 1999/5/1

N2 - A three-dimensional numerical model has been developed to simulate the motion of electrons inside the duct of a vacuum arc metal source. It is found that electrons will travel back and forth along the center axis inside the duct tube. This phenomenon of electron oscillation can be explained by the combined effects of the electric and magnetic fields. The electron oscillation will increase the charge state of the positive ions and the ions will gain more energy. Due to the influence of electron oscillation, the plasma throughput of the duct will be different from that of a duct under the influence of only the magnetic field. This finding should be taken into account when designing metal arc sources and optimizing their performance. © 1999 American Institute of Physics.

AB - A three-dimensional numerical model has been developed to simulate the motion of electrons inside the duct of a vacuum arc metal source. It is found that electrons will travel back and forth along the center axis inside the duct tube. This phenomenon of electron oscillation can be explained by the combined effects of the electric and magnetic fields. The electron oscillation will increase the charge state of the positive ions and the ions will gain more energy. Due to the influence of electron oscillation, the plasma throughput of the duct will be different from that of a duct under the influence of only the magnetic field. This finding should be taken into account when designing metal arc sources and optimizing their performance. © 1999 American Institute of Physics.

UR - https://www.scopus.com/pages/publications/0042160751

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0042160751&origin=recordpage

U2 - 10.1063/1.370103

DO - 10.1063/1.370103

M3 - RGC 21 - Publication in refereed journal

SN - 0021-8979

VL - 85

SP - 6381

EP - 6384

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 9

ER -

Computed electron oscillation inside the duct of a vacuum arc source

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