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Computational understanding of growth mechanism and novel properties of silicon nanowires [invited]

    Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

    Abstract

    The shrinkage of dimensions of nanomaterials is expected to lead to fascinating properties related to size effects, which may be exploited for future exciting applications (e.g. optoelectronic, chemical and biological sensing). Different aspects of nanoscience and technology (nanomaterials structure, growth mechanisms and properties) can be studied by modern computational methods, providing insight where experimental methods cannot and predicting properties to guide experimentalists. Here, we present examples of computations that address different aspects of science and technology of silicon nanowires. These examples include: the mechanism of oxide-assisted formation of silicon nanowires [1]; the thin stable short silicon nanowires [2]; size-dependent oxidation of silicon nanostructures [3]; the possible silica nano-architectures including nanowires or nanorods, fully coordinated nanotubes, discrete fullerene-like cage, and porous zeolite-like 3D networks [4]; and results of energetic, chemical, electronic, optical and transport properties of nanostructured materials towards designs of nanoelectronics and nanosensors [5].
    Original languageEnglish
    Title of host publication05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings
    Publication statusPublished - Oct 2005
    Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
    Duration: 30 Oct 20054 Nov 2005

    Publication series

    NameAIChE Annual Meeting, Conference Proceedings

    Conference

    Conference05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
    PlaceUnited States
    CityCincinnati, OH
    Period30/10/054/11/05

    Bibliographical note

    Publication information for this record has been verified with the author(s) concerned.

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