Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

Rayan M. Al-Assaad; Suresh Regonda; Li Tao; Stella W. Pang; Wenchuang Hu

doi:10.1116/1.2800327

Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

Rayan M. Al-Assaad, Suresh Regonda, Li Tao, Stella W. Pang, Wenchuang Hu

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

21 Citations (Scopus)

Abstract

The profile shape and the flow behavior of polymer nanoscale gratings made by a thermal nanoimprint process are precisely examined using visible light angular scatterometry. Nanoimprinted poly(methyl methacrylate) (PMMA) lines with 60-800 nm width, 100-200 nm height, and varied residual thicknesses of 70-400 nm have been investigated using this optical approach, and insightful observations are made regarding residual stress buildup during thermal nanoimprint. In addition, a nonlinear profile model has been developed for scatterometry to monitor the "melting" behavior of PMMA gratings under annealing around its glass transition temperature. The polymer nanostructures were found to relax primarily at high stress regions. © 2007 American Vacuum Society.

Original language	English
Pages (from-to)	2396-2401
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	25
Issue number	6
DOIs	https://doi.org/10.1116/1.2800327
Publication status	Published - 2007
Externally published	Yes

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title = "Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry",

abstract = "The profile shape and the flow behavior of polymer nanoscale gratings made by a thermal nanoimprint process are precisely examined using visible light angular scatterometry. Nanoimprinted poly(methyl methacrylate) (PMMA) lines with 60-800 nm width, 100-200 nm height, and varied residual thicknesses of 70-400 nm have been investigated using this optical approach, and insightful observations are made regarding residual stress buildup during thermal nanoimprint. In addition, a nonlinear profile model has been developed for scatterometry to monitor the {"}melting{"} behavior of PMMA gratings under annealing around its glass transition temperature. The polymer nanostructures were found to relax primarily at high stress regions. {\textcopyright} 2007 American Vacuum Society.",

author = "Al-Assaad, {Rayan M.} and Suresh Regonda and Li Tao and Pang, {Stella W.} and Wenchuang Hu",

year = "2007",

doi = "10.1116/1.2800327",

language = "English",

volume = "25",

pages = "2396--2401",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "0734-211X",

publisher = "American Institute of Physics",

number = "6",

}

Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry. / Al-Assaad, Rayan M.; Regonda, Suresh; Tao, Li et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 25, No. 6, 2007, p. 2396-2401.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

TY - JOUR

T1 - Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

AU - Al-Assaad, Rayan M.

AU - Regonda, Suresh

AU - Tao, Li

AU - Pang, Stella W.

AU - Hu, Wenchuang

PY - 2007

Y1 - 2007

N2 - The profile shape and the flow behavior of polymer nanoscale gratings made by a thermal nanoimprint process are precisely examined using visible light angular scatterometry. Nanoimprinted poly(methyl methacrylate) (PMMA) lines with 60-800 nm width, 100-200 nm height, and varied residual thicknesses of 70-400 nm have been investigated using this optical approach, and insightful observations are made regarding residual stress buildup during thermal nanoimprint. In addition, a nonlinear profile model has been developed for scatterometry to monitor the "melting" behavior of PMMA gratings under annealing around its glass transition temperature. The polymer nanostructures were found to relax primarily at high stress regions. © 2007 American Vacuum Society.

AB - The profile shape and the flow behavior of polymer nanoscale gratings made by a thermal nanoimprint process are precisely examined using visible light angular scatterometry. Nanoimprinted poly(methyl methacrylate) (PMMA) lines with 60-800 nm width, 100-200 nm height, and varied residual thicknesses of 70-400 nm have been investigated using this optical approach, and insightful observations are made regarding residual stress buildup during thermal nanoimprint. In addition, a nonlinear profile model has been developed for scatterometry to monitor the "melting" behavior of PMMA gratings under annealing around its glass transition temperature. The polymer nanostructures were found to relax primarily at high stress regions. © 2007 American Vacuum Society.

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U2 - 10.1116/1.2800327

DO - 10.1116/1.2800327

M3 - RGC 21 - Publication in refereed journal

SN - 0734-211X

VL - 25

SP - 2396

EP - 2401

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

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