Characterization of GaAs surfaces subjected to a Cl2/Ar high density plasma etching process

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Overview

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Material Science

Density Material Science

Gallium Arsenide Material Science

Plasma Etching Material Science

Surface (Surface Sc... Material Science

Surface Damage Material Science

Optical Measurement Material Science

III-V Semiconductor Material Science

Diffuse Reflectance... Material Science

Engineering

Gallium Arsenide Engineering

Etching Process Engineering

Process Condition Engineering

Compound Semiconduc... Engineering

Photoreflectance Engineering

Ion Energy Engineering

Anisotropic Engineering

Optoelectronics Engineering

Surface Process Engineering

Damage Assessment Engineering

Diffuse Reflectance Engineering

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