Characterization and optical investigation of BCN film deposited by RF magnetron sputtering

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • M. K. Lei
  • Quan Li
  • Z. F. Zhou
  • I Bello
  • S. T. Lee

Detail(s)

Original languageEnglish
Pages (from-to)194-199
Journal / PublicationThin Solid Films
Volume389
Issue number1-2
Publication statusPublished - 15 Jun 2001

Abstract

The amorphous boron-carbon-nitrogen (BCN) films were deposited by RF magnetron sputtering from a mixed target composed of h-BN and graphite. The growth temperature ranged from 250 to 550°C. This deposition temperature was shown to have significant effect on the composition and elemental binding states of the BCN films, i.e. the films with higher fraction of sp3 bindings of boron, carbon and nitrogen were obtained at higher deposition temperatures. The refractive index of the BCN films deposited under the above conditions were in the range of 2.1-2.4, and their optical bandgaps ranged from 1.48-2.00 eV. The amorphous B25C40N35 films which were deposited at 550°C, possessed superior optical properties. © 2001 Elsevier Science B.V.

Research Area(s)

  • BCN films, Optical bandgap, Optical properties, Refractive index, RF magnetron sputtering

Citation Format(s)

Characterization and optical investigation of BCN film deposited by RF magnetron sputtering. / Lei, M. K.; Li, Quan; Zhou, Z. F.; Bello, I; Lee, C. S.; Lee, S. T.

In: Thin Solid Films, Vol. 389, No. 1-2, 15.06.2001, p. 194-199.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review