Characterization and optical investigation of BCN film deposited by RF magnetron sputtering

The amorphous boron-carbon-nitrogen (BCN) films were deposited by RF magnetron sputtering from a mixed target composed of h-BN and graphite. The growth temperature ranged from 250 to 550°C. This deposition temperature was shown to have significant effect on the composition and elemental binding states of the BCN films, i.e. the films with higher fraction of sp³ bindings of boron, carbon and nitrogen were obtained at higher deposition temperatures. The refractive index of the BCN films deposited under the above conditions were in the range of 2.1-2.4, and their optical bandgaps ranged from 1.48-2.00 eV. The amorphous B₂₅C₄₀N₃₅ films which were deposited at 550°C, possessed superior optical properties. © 2001 Elsevier Science B.V.