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Characteristics of Si Thin Films Transferred onto Glass by Ion-Cut Employing Pulsed and Direct-Current (DC) Plasma Immersion Ion Implantation

  • F. Lu
  • , D. Qiao
  • , M. Cai
  • , P. K.L. Yu
  • , S. S. Lau
  • , R. K. Y. Fu
  • , C. P. Li
  • , L. S. Hung
  • , Paul K. Chu

    Research output: Conference PapersRGC 33 - Other conference paperpeer-review

    Original languageEnglish
    Pages22
    Publication statusPresented - Jun 2003
    Event45th TMS Electronic Materials Conference & Exhibition (EMC 2003) - Salt Lake City, United States
    Duration: 25 Jun 200327 Jun 2003

    Conference

    Conference45th TMS Electronic Materials Conference & Exhibition (EMC 2003)
    PlaceUnited States
    CitySalt Lake City
    Period25/06/0327/06/03

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