Characteristics of Phosphorus-Doped Diamond-Like Carbon Films Synthesized by Plasma Immersion Ion Implantation and Deposition (PIII&D)

Plasma immersion ion implantation and, deposition (PIII&D) is an effective approach to synthesize high quality thin films for different industrial purposes. The dual implantation and deposition process can produce a graded layer from the specimen surface that mitigates delamination and poor adhesion. In this work, phosphorus-doped diamond-like carbon @LC) films were synthesized by PIII&D. Thin DLC films with various phosphorus concentrations were produced by using different experimental parameters. The chemical composition was determined by X-ray photoelectron spectroscopy (XPS) and electron energy loss spectroscopy (EELS). Micrographs obtained by cross - sectional transmission electron microscopy (X-TEM) reveal good adhesion between the films and substrates. The biocompatibility properties were evaluated using platelet adhesive tests. The results show that a sample doped with an optimal amount of phosphorus exhibits less platelet adhesive and activation, and the overall results are better than that observed on low-temperature isotropic pyrolytic carbon (LTIC). Phosphorus-doped DLC films thus have potential applications in blood contacting medical devices.