Abstract
This paper briefly reviews our recent experiments on high-rate deposition of high-quality cBN films by bias assisted plasma jet CVD in an Ar-N2-BF3-H2 gas system. The experimental procedure, characteristics of the films obtained, and dependence of film quality on process parameters are summarized. Roles of fluorine, substrate bias, and an arc jet plasma are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 1-10 |
| Journal | New Diamond and Frontier Carbon Technology |
| Volume | 11 |
| Issue number | 1 |
| Publication status | Published - 2001 |
| Externally published | Yes |
Research Keywords
- Bias
- c-BN
- cBN film
- Cubic boron nitride
- CVD
- dc arc jet
- Fluorine
- Plasma jet