Capacitance of high-voltage coaxial cable in plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

3 Scopus Citations
View graph of relations

Author(s)

  • X. B. Tian
  • L. P. Wang
  • D. T K Kwok
  • B. Y. Tang
  • P. K. Chu

Detail(s)

Original languageEnglish
Pages (from-to)41-42
Journal / PublicationJournal of Materials Science and Technology
Volume17
Issue number1
Publication statusPublished - Jan 2001

Abstract

Plasma immersion ion implantation (Plll) is an excellent technique for the surface modification of complex-shaped components. Owing to pulsed operation mode of the high voltage and large slew rate, the capacitance on the high-voltage coaxial cable can be detrimental to the process and cannot be ignored . In fact, a significant portion of the rise-time/fall-time of the implantation voltage pulse and big initial current can be attributed to the coaxial cable.

Citation Format(s)

Capacitance of high-voltage coaxial cable in plasma immersion ion implantation. / Tian, X. B.; Wang, L. P.; Kwok, D. T K; Tang, B. Y.; Chu, P. K.

In: Journal of Materials Science and Technology, Vol. 17, No. 1, 01.2001, p. 41-42.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal