Buried tungsten silicide layer in silicon on insulator substrate by Smart-Cut

Suhua Luo^*, Weili Liu, Miao Zhang, Chenglu Lin, Z. T. Song, Paul K. Chu

^*Corresponding author for this work

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Publication status	Published - 4 Jun 2005
Event	The 10th Annual Conference of The Physical Society of Hong Kong - City University of Hong Kong, Hong Kong, China Duration: 4 Jun 2005 → 4 Jun 2005

Conference	The 10th Annual Conference of The Physical Society of Hong Kong
Place	China
City	Hong Kong
Period	4/06/05 → 4/06/05

Other Access Options

@conference{94b500ff39724d66aa7e418e9c32b323,

title = "Buried tungsten silicide layer in silicon on insulator substrate by Smart-Cut",

author = "Suhua Luo and Weili Liu and Miao Zhang and Chenglu Lin and Song, {Z. T.} and Chu, {Paul K.}",

year = "2005",

month = jun,

day = "4",

language = "English",

note = "The 10th Annual Conference of The Physical Society of Hong Kong ; Conference date: 04-06-2005 Through 04-06-2005",

}

TY - CONF

T1 - Buried tungsten silicide layer in silicon on insulator substrate by Smart-Cut

AU - Luo, Suhua

AU - Liu, Weili

AU - Zhang, Miao

AU - Lin, Chenglu

AU - Song, Z. T.

AU - Chu, Paul K.

PY - 2005/6/4

Y1 - 2005/6/4

M3 - RGC 32 - Refereed conference paper (without host publication)

T2 - The 10th Annual Conference of The Physical Society of Hong Kong

Y2 - 4 June 2005 through 4 June 2005

ER -