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Bottom-Up Nano-heteroepitaxy of Wafer-Scale Semipolar GaN on (001) Si

  • Jui-Wei Hus
  • , Chien-Chia Chen
  • , Ming-Jui Lee
  • , Hsueh-Hsing Liu
  • , Jen-Inn Chyi
  • , Michael R. S. Huang
  • , Chuan-Pu Liu
  • , Tzu-Chiao Wei
  • , Jr-Hau He
  • , Kun-Yu Lai*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Semipolar {101¯1} InGaN quantum wells are grown on (001) Si substrates with an Al-free buffer and wafer-scale uniformity. The novel structure is achieved by a bottom-up nano-heteroepitaxy employing self-organized ZnO nanorods as the strain-relieving layer. This ZnO nanostructure unlocks the problems encountered by the conventional AlN-based buffer, which grows slowly and contaminates the growth chamber.
Original languageEnglish
Pages (from-to)4845-4850
JournalAdvanced Materials
Volume27
Issue number33
Online published15 Jul 2015
DOIs
Publication statusPublished - 2 Sept 2015
Externally publishedYes

Research Keywords

  • GaN
  • nano-heteroepitaxy
  • quantum well
  • semipolar
  • Si substrate

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