Abstract
Semipolar {101¯1} InGaN quantum wells are grown on (001) Si substrates with an Al-free buffer and wafer-scale uniformity. The novel structure is achieved by a bottom-up nano-heteroepitaxy employing self-organized ZnO nanorods as the strain-relieving layer. This ZnO nanostructure unlocks the problems encountered by the conventional AlN-based buffer, which grows slowly and contaminates the growth chamber.
| Original language | English |
|---|---|
| Pages (from-to) | 4845-4850 |
| Journal | Advanced Materials |
| Volume | 27 |
| Issue number | 33 |
| Online published | 15 Jul 2015 |
| DOIs | |
| Publication status | Published - 2 Sept 2015 |
| Externally published | Yes |
Research Keywords
- GaN
- nano-heteroepitaxy
- quantum well
- semipolar
- Si substrate
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