Boron contaminations and their kinetics in Ni3(Si,Ti) alloys

T. Takasugi; C. T. Liu; L. Heatherly; E. H. Lee; E. P. George

doi:10.1016/S0966-9795(97)00083-6

Boron contaminations and their kinetics in Ni3(Si,Ti) alloys

T. Takasugi, C. T. Liu, L. Heatherly, E. H. Lee, E. P. George

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

4 Citations (Scopus)

Abstract

The sources of boron contamination in Ni₃(Si,Ti) alloys originally prepared as boron-free alloys in two different places were determined using an Auger instrument. Based on the correlation between the detected grain boundary compositions and the adopted processings, the cross-annealings with boron-doped alloys and annealings in a previously boron-contaminated furnace were identified as the possible sources of the boron contamination. Also, a simulation of the boron contamination where a boron-free Ni₃(Si,Ti) alloy was cross-annealed in vacuum with a boron-doped Ni₃(Si,Ti) alloy was performed. The boron penetration from the alloy surface was measured, and the corresponding diffusion coefficient of boron was estimated. Based on the obtained results, some implications are discussed. © 1998 Published by Elsevier Science Limited. All rights reserved.

Original language	English
Pages (from-to)	369-377
Journal	Intermetallics
Volume	6
Issue number	5
DOIs	https://doi.org/10.1016/S0966-9795(97)00083-6
Publication status	Published - Aug 1998
Externally published	Yes

Research Keywords

A. Silicides, various
B. Diffusion
C. Interstitial content, control
D. Grain boundaries, structure
F. Electron microprobe

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10.1016/S0966-9795(97)00083-6

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title = "Boron contaminations and their kinetics in Ni3(Si,Ti) alloys",

abstract = "The sources of boron contamination in Ni3(Si,Ti) alloys originally prepared as boron-free alloys in two different places were determined using an Auger instrument. Based on the correlation between the detected grain boundary compositions and the adopted processings, the cross-annealings with boron-doped alloys and annealings in a previously boron-contaminated furnace were identified as the possible sources of the boron contamination. Also, a simulation of the boron contamination where a boron-free Ni3(Si,Ti) alloy was cross-annealed in vacuum with a boron-doped Ni3(Si,Ti) alloy was performed. The boron penetration from the alloy surface was measured, and the corresponding diffusion coefficient of boron was estimated. Based on the obtained results, some implications are discussed. {\textcopyright} 1998 Published by Elsevier Science Limited. All rights reserved.",

keywords = "A. Silicides, various, B. Diffusion, C. Interstitial content, control, D. Grain boundaries, structure, F. Electron microprobe",

author = "T. Takasugi and Liu, {C. T.} and L. Heatherly and Lee, {E. H.} and George, {E. P.}",

year = "1998",

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TY - JOUR

T1 - Boron contaminations and their kinetics in Ni3(Si,Ti) alloys

AU - Takasugi, T.

AU - Liu, C. T.

AU - Heatherly, L.

AU - Lee, E. H.

AU - George, E. P.

PY - 1998/8

Y1 - 1998/8

N2 - The sources of boron contamination in Ni3(Si,Ti) alloys originally prepared as boron-free alloys in two different places were determined using an Auger instrument. Based on the correlation between the detected grain boundary compositions and the adopted processings, the cross-annealings with boron-doped alloys and annealings in a previously boron-contaminated furnace were identified as the possible sources of the boron contamination. Also, a simulation of the boron contamination where a boron-free Ni3(Si,Ti) alloy was cross-annealed in vacuum with a boron-doped Ni3(Si,Ti) alloy was performed. The boron penetration from the alloy surface was measured, and the corresponding diffusion coefficient of boron was estimated. Based on the obtained results, some implications are discussed. © 1998 Published by Elsevier Science Limited. All rights reserved.

AB - The sources of boron contamination in Ni3(Si,Ti) alloys originally prepared as boron-free alloys in two different places were determined using an Auger instrument. Based on the correlation between the detected grain boundary compositions and the adopted processings, the cross-annealings with boron-doped alloys and annealings in a previously boron-contaminated furnace were identified as the possible sources of the boron contamination. Also, a simulation of the boron contamination where a boron-free Ni3(Si,Ti) alloy was cross-annealed in vacuum with a boron-doped Ni3(Si,Ti) alloy was performed. The boron penetration from the alloy surface was measured, and the corresponding diffusion coefficient of boron was estimated. Based on the obtained results, some implications are discussed. © 1998 Published by Elsevier Science Limited. All rights reserved.

KW - A. Silicides, various

KW - B. Diffusion

KW - C. Interstitial content, control

KW - D. Grain boundaries, structure

KW - F. Electron microprobe

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U2 - 10.1016/S0966-9795(97)00083-6

DO - 10.1016/S0966-9795(97)00083-6

M3 - RGC 21 - Publication in refereed journal

SN - 0966-9795

VL - 6

SP - 369

EP - 377

JO - Intermetallics

JF - Intermetallics

IS - 5

ER -

Boron contaminations and their kinetics in Ni3(Si,Ti) alloys

Abstract

Research Keywords

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