Bonding and band offset in N2O-grown oxynitride
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
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Detail(s)
Original language | English |
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Pages (from-to) | 241-245 |
Journal / Publication | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
Volume | 21 |
Issue number | 1 SPEC. |
Publication status | Published - Jan 2003 |
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Abstract
The oxynitride prepared by N2 oxidation was studied by XPS. It was found that the oxynitride is essentially a thermal oxide. The nitrogen content is very low, and the nitrogen atoms create the Si3N species at the Si/dielectric interface. The valence-and conduction-band offsets of N2O oxynitride are the same as that at the Si/SiO2 interface. Removal of Si-Si bonds and Pb centers during nitridation occurred and explained by the creation of Si-N bonds.
Citation Format(s)
Bonding and band offset in N2O-grown oxynitride. / Gritsenko, V. A.; Wong, Hei; Kwok, W. M. et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 1 SPEC., 01.2003, p. 241-245.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 1 SPEC., 01.2003, p. 241-245.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review