Bandgap engineering of rippled MoS2 monolayer under external electric field
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 173112 |
Journal / Publication | Applied Physics Letters |
Volume | 102 |
Issue number | 17 |
Publication status | Published - 29 Apr 2013 |
Externally published | Yes |
Link(s)
Abstract
In this letter we propose a universal strategy combining external electric field with the ripple of membrane to tune the bandgap of semiconducting atomic monolayer. By first-principles calculations we show that the bandgap of rippled MoS2 monolayer can be tuned in a large range by vertical external electric field, which is expected to have little effect on MoS2 monolayer. This phenomenon can be explained from charge redistribution under external electric field by a simple model. This may open an avenue of optimizing monolayer MoS2 for electronic and optoelectronic applications by surface patterning. © 2013 AIP Publishing LLC.
Citation Format(s)
Bandgap engineering of rippled MoS2 monolayer under external electric field. / Qi, Jingshan; Li, Xiao; Qian, Xiaofeng et al.
In: Applied Physics Letters, Vol. 102, No. 17, 173112, 29.04.2013.
In: Applied Physics Letters, Vol. 102, No. 17, 173112, 29.04.2013.
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review