Atomic Layer Deposition—A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

7 Scopus Citations
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Author(s)

  • Mohd Zahid Ansari
  • Debananda Mohapatra
  • Sajid Ali Ansari
  • Reza Rahighi
  • Dip K Nandi
  • Wooseok Song
  • Soo-Hyun Kim

Related Research Unit(s)

Detail(s)

Original languageEnglish
Article number2303055
Journal / PublicationAdvanced Science
Volume11
Issue number1
Online published8 Nov 2023
Publication statusPublished - 5 Jan 2024

Link(s)

Abstract

Atomic layer deposition (ALD) has become the most widely used thin-film deposition technique in various fields due to its unique advantages, such as self-terminating growth, precise thickness control, and excellent deposition quality. In the energy storage domain, ALD has shown great potential for supercapacitors (SCs) by enabling the construction and surface engineering of novel electrode materials. This review aims to present a comprehensive outlook on the development, achievements, and design of advanced electrodes involving the application of ALD for realizing high-performance SCs to date, as organized in several sections of this paper. Specifically, this review focuses on understanding the influence of ALD parameters on the electrochemical performance and discusses the ALD of nanostructured electrochemically active electrode materials on various templates for SCs. It examines the influence of ALD parameters on electrochemical performance and highlights ALD's role in passivating electrodes and creating 3D nanoarchitectures. The relationship between synthesis procedures and SC properties is analyzed to guide future research in preparing materials for various applications. Finally, it is concluded by suggesting the directions and scope of future research and development to further leverage the unique advantages of ALD for fabricating new materials and harness the unexplored opportunities in the fabrication of advanced-generation SCs. © 2023 The Authors. Advanced Science published by Wiley-VCH GmbH.

Research Area(s)

  • atomic layer deposition (ALD), electrode architecture designs, electrode materials, performance optimization, thin films

Citation Format(s)

Atomic Layer Deposition—A Versatile Toolbox for Designing/Engineering Electrodes for Advanced Supercapacitors. / Ansari, Mohd Zahid; Hussain, Iftikhar; Mohapatra, Debananda et al.
In: Advanced Science, Vol. 11, No. 1, 2303055, 05.01.2024.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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