TY - GEN
T1 - ARImp
T2 - 2010 20th International Conference on Pattern Recognition, ICPR 2010
AU - Zhang, Shaohong
AU - Wong, Hau-San
PY - 2010
Y1 - 2010
N2 - Adjusted Rand Index (ARI) is one of the most popular measure to evaluate the consistency between two partitions of data sets in the areas of pattern recognition. In this paper, ARI is generalized to a new measure, Adjusted Rand Index between a similarity matrix and a cluster partition (ARImp), to evaluate the consistency between a set of clustering solutions (or cluster partitions) and their associated consensus matrix in a cluster ensemble. The generalization property of ARImp from ARI is proved and its preservation of desirable properties of ARI is illustrated with simulated experiments. Also, we show with application experiments on several real data sets that ARImp can serve as a filter to identify the less effective cluster ensemble methods. © 2010 IEEE.
AB - Adjusted Rand Index (ARI) is one of the most popular measure to evaluate the consistency between two partitions of data sets in the areas of pattern recognition. In this paper, ARI is generalized to a new measure, Adjusted Rand Index between a similarity matrix and a cluster partition (ARImp), to evaluate the consistency between a set of clustering solutions (or cluster partitions) and their associated consensus matrix in a cluster ensemble. The generalization property of ARImp from ARI is proved and its preservation of desirable properties of ARI is illustrated with simulated experiments. Also, we show with application experiments on several real data sets that ARImp can serve as a filter to identify the less effective cluster ensemble methods. © 2010 IEEE.
UR - https://www.scopus.com/pages/publications/78149475517
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-78149475517&origin=recordpage
U2 - 10.1109/ICPR.2010.196
DO - 10.1109/ICPR.2010.196
M3 - RGC 32 - Refereed conference paper (with host publication)
SN - 9780769541099
SP - 778
EP - 781
BT - Proceedings - International Conference on Pattern Recognition
Y2 - 23 August 2010 through 26 August 2010
ER -