Argon ion stimulated conversion between CFx (x = 0-3) chemical states and fluorine depletion in fluorocarbon films studied by X-ray photoelectron spectroscopy

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

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Author(s)

  • S. W. Tong
  • M. K. Fung
  • Y. Lifshitz
  • S. T. Lee
  • A. Hoffman

Detail(s)

Original languageEnglish
Pages (from-to)19-25
Journal / PublicationApplied Surface Science
Volume220
Issue number1-4
Publication statusPublished - 30 Dec 2003

Abstract

Surface chemical composition of fluorocarbon films deposited onto indium-tin-oxide (ITO) substrates was modified by 2.0keV Ar+ irradiation with doses of up to 2.6 × 1013 ions/cm 2. The effect of ion irradiation on the chemical composition and bonding configuration of the upper-surface and sub-surface regions were monitored by high-resolution angle-resolved X-ray photoelectron spectroscopy (AR-XPS). It was found that the as-deposited films compose of a distribution of CF, CF2, CF3 and C-C chemical states. C 1s line-shape analysis of XPS spectra measured at grazing and normal emission angles shows that as a result of the irradiation, the population of the CF3 and CF2 chemical states were preferentially depleted from the film's surface resulting in an increased population of the CF and C-C chemical states in the upper-surface region of the film. It is suggested that low energy ion irradiation can be used to chemically modify the surface of fluorocarbon films. © 2003 Published by Elsevier B.V.

Research Area(s)

  • AR-XPS, Depletion, Fluorocarbon

Citation Format(s)

Argon ion stimulated conversion between CFx (x = 0-3) chemical states and fluorine depletion in fluorocarbon films studied by X-ray photoelectron spectroscopy. / Tong, S. W.; Fung, M. K.; Lee, C. S.; Lifshitz, Y.; Lee, S. T.; Hoffman, A.

In: Applied Surface Science, Vol. 220, No. 1-4, 30.12.2003, p. 19-25.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal