Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

Overview

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Author(s)

Paul Kim Ho CHU (Inventor)
Liuhe LI (Inventor)

Related Research Unit(s)

Department of Physics

Detail(s)

Original language	English
Patent number	US8,119,208
Filing number	12/106,009
Publication status	Accepted/In press/Filed - 18 Apr 2008 Published - 21 Feb 2012

Link(s)

	Check@CityULib
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(45799666-0833-4758-a731-6279496d14b0).html

Citation Format(s)

[ RIS ] [ BibTeX ]

Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. / CHU, Paul Kim Ho (Inventor); LI, Liuhe (Inventor).

Patent No.: US8,119,208. Feb 21, 2012.

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

CHU, PKH & LI, L Feb. 21 2012, Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation, Patent No. US8,119,208.

CHU, P. K. H., & LI, L. (2012). Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. (Patent No. US8,119,208).

CHU PKH, LI L, inventors. Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. US8,119,208. 2012 Feb 21.

CHU, Paul Kim Ho (Inventor) ; LI, Liuhe (Inventor). / Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. Patent No.: US8,119,208. Feb 21, 2012.