Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

Overview

View graph of relations

Author(s)

Paul Kim Ho CHU (Inventor)
Liuhe LI (Inventor)

Related Research Unit(s)

Department of Physics

Detail(s)

Original language	English
Patent number	US8,119,208 B2
Filing number	12/106,009
Publication status	Accepted/In press/Filed - 18 Apr 2008 Published - 21 Feb 2012

Link(s)

	Check@CityULib
Other link(s)	View in CityU Patent Database
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(45799666-0833-4758-a731-6279496d14b0).html

Citation Format(s)

[ RIS ] [ BibTeX ]

Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. / CHU, Paul Kim Ho (Inventor); LI, Liuhe (Inventor).

Patent No.: US8,119,208 B2. Feb 21, 2012.

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)

CHU, PKH & LI, L Feb. 21 2012, Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation, Patent No. US8,119,208 B2.

CHU, P. K. H., & LI, L. (2012). Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. (Patent No. US8,119,208 B2).

CHU PKH, LI L, inventors. Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. US8,119,208 B2. 2012 Feb 21.

CHU, Paul Kim Ho (Inventor) ; LI, Liuhe (Inventor). / Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. Patent No.: US8,119,208 B2. Feb 21, 2012.