Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation
Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)
Author(s)
Related Research Unit(s)
Detail(s)
Original language | English |
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Patent number | US8,119,208 B2 |
Filing number | 12/106,009 |
Publication status |
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Link(s)
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Permanent Link | https://scholars.cityu.edu.hk/en/publications/publication(45799666-0833-4758-a731-6279496d14b0).html |
Citation Format(s)
Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. / CHU, Paul Kim Ho (Inventor); LI, Liuhe (Inventor).
Patent No.: US8,119,208 B2. Feb 21, 2012.Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53) › 51_Patents granted (CityU only, data source from KTO)