Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53)51_Patents granted (CityU only, data source from KTO)

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Detail(s)

Original languageEnglish
Patent numberUS8,119,208 B2
Filing number12/106,009
Publication status
  • Accepted/In press/Filed - 18 Apr 2008
  • Published - 21 Feb 2012

Citation Format(s)

Apparatus and Method for Focused Electric Field Enhanced Plasma-Based Ion Implantation. / CHU, Paul Kim Ho (Inventor); LI, Liuhe (Inventor).

Patent No.: US8,119,208 B2. Feb 21, 2012.

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53)51_Patents granted (CityU only, data source from KTO)