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Antistick postpassivation of high-aspect ratio silicon molds fabricated by deep-reactive ion etching
J. X. Gao, L. P. Yeo, M. B. Chan-Park, J. M. Miao, Y. H. Yan, J. B. Sun, Y. C. Lam, C. Y. Yue
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
37
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(Scopus)