Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step

Junyong Park; Sanghoon Yoon; Seokwoo Jeon; Kisuk Kang

doi:10.1002/smll.201000275

Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step

Junyong Park
, Sanghoon Yoon
, Seokwoo Jeon
, Kisuk Kang

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

38 Citations (Scopus)

Abstract

Multidimensional nanostructures that are fabricated by proximity field nanopatterning offer a platform to measure antireflection behavior. Transmittance or opaqueness are gradually changed by controlling the thickness of 3D nanostructures.

Original language	English
Pages (from-to)	1981-1985
Journal	Small
Volume	6
Issue number	18
DOIs	https://doi.org/10.1002/smll.201000275
Publication status	Published - 20 Sept 2010
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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title = "Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step",

abstract = "Multidimensional nanostructures that are fabricated by proximity field nanopatterning offer a platform to measure antireflection behavior. Transmittance or opaqueness are gradually changed by controlling the thickness of 3D nanostructures.",

author = "Junyong Park and Sanghoon Yoon and Seokwoo Jeon and Kisuk Kang",

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AU - Park, Junyong

AU - Yoon, Sanghoon

AU - Jeon, Seokwoo

AU - Kang, Kisuk

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2010/9/20

Y1 - 2010/9/20

N2 - Multidimensional nanostructures that are fabricated by proximity field nanopatterning offer a platform to measure antireflection behavior. Transmittance or opaqueness are gradually changed by controlling the thickness of 3D nanostructures.

AB - Multidimensional nanostructures that are fabricated by proximity field nanopatterning offer a platform to measure antireflection behavior. Transmittance or opaqueness are gradually changed by controlling the thickness of 3D nanostructures.

UR - https://www.scopus.com/pages/publications/77956910216

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U2 - 10.1002/smll.201000275

DO - 10.1002/smll.201000275

M3 - RGC 21 - Publication in refereed journal

C2 - 20715070

SN - 1613-6810

VL - 6

SP - 1981

EP - 1985

JO - Small

JF - Small

IS - 18

ER -

Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step

Abstract

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