Anode/organic interface modification by plasma polymerized fluorocarbon films

J. X. Tang; Y. Q. Li; L. R. Zheng; L. S. Hung

doi:10.1063/1.1667276

Anode/organic interface modification by plasma polymerized fluorocarbon films

J. X. Tang
, Y. Q. Li
, L. R. Zheng
, L. S. Hung

Department of Physics

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

52 Citations (Scopus)

Abstract

The effects of plasma polymerized fluorocarbon films (CF_x) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CF_x film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air.
© 2004 American Institute of Physics

Original language	English
Pages (from-to)	4397-4403
Journal	Journal of Applied Physics
Volume	95
Issue number	8
DOIs	https://doi.org/10.1063/1.1667276
Publication status	Published - 15 Apr 2004

Bibliographical note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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title = "Anode/organic interface modification by plasma polymerized fluorocarbon films",

abstract = "The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air. {\textcopyright} 2004 American Institute of Physics",

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AU - Tang, J. X.

AU - Li, Y. Q.

AU - Zheng, L. R.

AU - Hung, L. S.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2004/4/15

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N2 - The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air. © 2004 American Institute of Physics

AB - The effects of plasma polymerized fluorocarbon films (CFx) on device performance in organic light-emitting diodes (OLED) were analyzed. OLEDs with a 0.3-nm thick CFx film on an untreated indium tin oxide (ITO) anode showed identical current density-voltage characteristics and improved operational stability. By the formation of an artificial dipolar layer resulting from rich, negatively charged fluorine, the enhancement of hole injection was attributed to the manipulation of the energy level offset at the anode/organic interface. It was found that the dipolar interface was fairly stable when being exposed to air. © 2004 American Institute of Physics

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U2 - 10.1063/1.1667276

DO - 10.1063/1.1667276

M3 - RGC 21 - Publication in refereed journal

SN - 0021-8979

VL - 95

SP - 4397

EP - 4403

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 8

ER -

Anode/organic interface modification by plasma polymerized fluorocarbon films

Abstract

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