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Annealing of ion implant damage in the high-temperature superconductor YBa2Cu3O7-x

  • A. D. Marwick
  • , G. J. Clark
  • , K. N. Tu
  • , D. S. Yee
  • , C. Lee
  • , U. N. Singh
  • , J. Doyle
  • , J. J. Cuomo

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

It was found that the increase in room-temperature resistivity caused by ion bombardment damage in YBa2Cu3O7-x could be completely recovered by annealing if the damage dose was small. A small resistivity increment (~ 0.2%), caused by a very small ion dose, annealed at room temperature. For a larger ion dose, sufficient to double the resistivity, complete recovery of room-temperature resistivity was produced by annealing at 500 °C in O2, but recovery after still larger doses was incomplete. © 1989.
Original languageEnglish
Pages (from-to)612-614
JournalNuclear Inst. and Methods in Physics Research, B
Volume40-41
Issue numberPART 1
DOIs
Publication statusPublished - 2 Apr 1989
Externally publishedYes

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