Annealing behavior and hardness enhancement of amorphous SiCN thin films

S. L. Ma; B. Xu; K. W. Xu; X. L. Wu; Paul K. Chu

doi:10.1116/1.2764080

Author(s)

S. L. Ma
B. Xu
K. W. Xu
X. L. Wu
Paul K. Chu

Detail(s)

Original language	English
Pages (from-to)	1407-1410
Journal / Publication	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	25
Issue number	5
Publication status	Published - 2007

Link(s)

DOI	DOI https://doi.org/10.1116/1.2764080 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-34548220410&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(391b6e4c-afaa-4e90-8ad0-ee7087fc99c2).html

Abstract

Amorphous silicon carbon nitrogen (SiCN) films deposited on stainless steel by radio frequency magnetron sputtering are annealed at different temperatures in hydrogen to investigate the phase transformation kinetics and the impact on film hardness. The SiCN films with polycrystalline structure are formed after annealing at 900 °C and the polycrystalline structures contain SiC, Si3 N4, and C3 N4 phases. The polycrystalline transformation is discussed using a thermodynamics mechanism. Our results reveal that the emergence of homogeneous particle reinforced composite SiCN structure and polycrystalline phases related to SiC, Si3 N4, and C3 N4 may be responsible for the hardness enhancement of the annealed SiCN films. © 2007 American Vacuum Society.

Citation Format(s)

[ RIS ] [ BibTeX ]

Annealing behavior and hardness enhancement of amorphous SiCN thin films. / Ma, S. L.; Xu, B.; Xu, K. W. et al.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 25, No. 5, 2007, p. 1407-1410.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Ma, SL, Xu, B, Xu, KW, Wu, XL & Chu, PK 2007, 'Annealing behavior and hardness enhancement of amorphous SiCN thin films', Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, vol. 25, no. 5, pp. 1407-1410. https://doi.org/10.1116/1.2764080

Ma, S. L., Xu, B., Xu, K. W., Wu, X. L., & Chu, P. K. (2007). Annealing behavior and hardness enhancement of amorphous SiCN thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 25(5), 1407-1410. https://doi.org/10.1116/1.2764080

Ma SL, Xu B, Xu KW, Wu XL, Chu PK. Annealing behavior and hardness enhancement of amorphous SiCN thin films. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2007;25(5):1407-1410. doi: 10.1116/1.2764080

Ma, S. L. ; Xu, B. ; Xu, K. W. et al. / Annealing behavior and hardness enhancement of amorphous SiCN thin films. In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 2007 ; Vol. 25, No. 5. pp. 1407-1410.