Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy

T. Okumura; K. N. Tu

doi:10.1063/1.332055

Author(s)

T. Okumura
K. N. Tu

Detail(s)

Original language	English
Pages (from-to)	922-927
Journal / Publication	Journal of Applied Physics
Volume	54
Issue number	2
Publication status	Published - 1983
Externally published	Yes

Link(s)

DOI	DOI https://doi.org/10.1063/1.332055 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0020704408&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(8b08d67b-a50a-4aa6-81a6-ca23dbcbb14e).html

Abstract

A differential analysis of internal photoemission spectroscopy has been developed for the study of nonuniformity in a Schottky contact. The analysis is capable of revealing the presence of a high-low parallel contact in a spectroscopic manner. It has been applied to a discrete parallel contact consisting of Pd₂Si and NiSi as well as a nonuniform contact of Pd on Si in the as-deposited state. The nonuniformity in the latter case is due to the existence of high barrier regions (0.86 eV) in parallel to those of Pd ₂Si (0.74 eV) and it disappears after a subsequent annealing at 250 or 450°C.

Bibliographic Note

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Citation Format(s)

[ RIS ] [ BibTeX ]

Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy. / Okumura, T.; Tu, K. N.
In: Journal of Applied Physics, Vol. 54, No. 2, 1983, p. 922-927.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Okumura, T & Tu, KN 1983, 'Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy', Journal of Applied Physics, vol. 54, no. 2, pp. 922-927. https://doi.org/10.1063/1.332055

Okumura, T., & Tu, K. N. (1983). Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy. Journal of Applied Physics, 54(2), 922-927. https://doi.org/10.1063/1.332055

Okumura T, Tu KN. Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy. Journal of Applied Physics. 1983;54(2):922-927. doi: 10.1063/1.332055

Okumura, T. ; Tu, K. N. / Analysis of parallel Schottky contacts by differential internal photoemission spectroscopy. In: Journal of Applied Physics. 1983 ; Vol. 54, No. 2. pp. 922-927.