Amorphous and nanocrystalline sputtered Mg-Cu thin films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review

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Author(s)

  • H. S. Chou
  • Y. H. Lai
  • L. W. Chang
  • X. H. Du
  • J. P. Chu
  • T. G. Nieh

Detail(s)

Original languageEnglish
Pages (from-to)341-345
Journal / PublicationJournal of Alloys and Compounds
Volume483
Issue number1-2
Online published12 Dec 2008
Publication statusPublished - 26 Aug 2009
Externally publishedYes

Abstract

Binary Mg-Cu amorphous alloys were first fabricated in 1980s via liquid quenching. In this study, the Mg1-xCux (x varying from 38 at.% to 82 at.%) partially amorphous thin films are prepared via co-sputtering. Upon thermal annealing, the Mg2Cu or MgCu2 nanocrystalline phases are induced in the Mg-rich or Cu-rich thin films, respectively. Due to the presence of fine nanocrystalline Mg2Cu or MgCu2 particles in the Mg-Cu amorphous matrix, the as-sputtered thin films show satisfactory Young's modulus ∼100 GPa and hardness ∼4 GPa. 

Research Area(s)

  • Amorphous materials, Intermetallics, Scanning and transmission electron microscopy, Thin films

Citation Format(s)

Amorphous and nanocrystalline sputtered Mg-Cu thin films. / Chou, H. S.; Huang, J. C.; Lai, Y. H.; Chang, L. W.; Du, X. H.; Chu, J. P.; Nieh, T. G.

In: Journal of Alloys and Compounds, Vol. 483, No. 1-2, 26.08.2009, p. 341-345.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalNot applicablepeer-review