Ambient effect on the electronic structures of tris-(8-hydroxyquinoline) aluminum films investigated by photoelectron spectroscopy

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

27 Scopus Citations
View graph of relations

Author(s)

  • L. S. Liao
  • X. H. Sun
  • L. F. Cheng
  • N. B. Wong
  • S. T. Lee

Detail(s)

Original languageEnglish
Pages (from-to)212-216
Journal / PublicationChemical Physics Letters
Volume333
Issue number3-4
Publication statusPublished - 12 Jan 2001

Abstract

Thin films of tris-(8-hydroxyquinoline) aluminum (Alq3) were exposed to trace amounts of O2, CO2, H2O, or to ambient air. Evolution of electronic structures of Alq3 films with increasing gas exposure was measured using ultraviolet photoelectron spectroscopy and X-ray photoelectron spectroscopy (XPS). The vacuum energy level, the highest occupied molecular orbital, and XPS core levels of the constituting elements in Alq3 shifted according to the kind of gas exposure. Chemical reaction between oxygen and the Alq3 films was observed upon oxygen exposure. Moreover, it was found that the dominant influence of ambient conditions on the electronic structures of the Alq3 films was from H2O. © 2001 Elsevier Science B.V.

Citation Format(s)

Ambient effect on the electronic structures of tris-(8-hydroxyquinoline) aluminum films investigated by photoelectron spectroscopy. / Liao, L. S.; Sun, X. H.; Cheng, L. F.; Wong, N. B.; Lee, C. S.; Lee, S. T.

In: Chemical Physics Letters, Vol. 333, No. 3-4, 12.01.2001, p. 212-216.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal