Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

Jae Hong Park; Hyun Ik Jang; Jun Yong Park; Seok Woo Jeon; Woo Choong Kim; Hee Yeoun Kim; Chi Won Ahn

doi:10.1117/12.2080980

Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

Jae Hong Park^*
, Hyun Ik Jang
, Jun Yong Park
, Seok Woo Jeon
, Woo Choong Kim
, Hee Yeoun Kim
, Chi Won Ahn

^*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

Original language	English
Title of host publication	Proceedings of SPIE
Subtitle of host publication	Alternative Lithographic Technologies VII
Editors	Douglas J. Resnick, Christopher Bencher
Publisher	SPIE
Volume	9423
ISBN (Print)	9781628415254
DOIs	https://doi.org/10.1117/12.2080980
Publication status	Published - Mar 2015
Externally published	Yes
Event	Alternative Lithographic Technologies VII - San Jose, United States Duration: 23 Feb 2015 → 26 Feb 2015 https://spie.org/AL15/conferencedetails/alternative-lithographic-technologies (Link to conference page)

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Alternative Lithographic Technologies VII
Place	United States
City	San Jose
Period	23/02/15 → 26/02/15
Internet address	https://spie.org/AL15/conferencedetails/alternative-lithographic-technologies (Link to conference page)

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 7 Affordable and Clean Energy

Research Keywords

infrared
lithography
molding
nano lens
nano patterning
nano structure
soft
Silicon
Nanostructures
Nickel
Lithography
Platinum
Nanolithography
Polymers
Infrared lenses
Infrared radiation
Lenses

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10.1117/12.2080980

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Park, J. H., Jang, H. I., Park, J. Y., Jeon, S. W., Kim, W. C., Kim, H. Y., & Ahn, C. W. (2015). Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses. In D. J. Resnick, & C. Bencher (Eds.), Proceedings of SPIE: Alternative Lithographic Technologies VII (Vol. 9423). Article 94231N (Proceedings of SPIE - The International Society for Optical Engineering). SPIE. https://doi.org/10.1117/12.2080980

Park, Jae Hong ; Jang, Hyun Ik ; Park, Jun Yong et al. / Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses. Proceedings of SPIE: Alternative Lithographic Technologies VII. editor / Douglas J. Resnick ; Christopher Bencher. Vol. 9423 SPIE, 2015. (Proceedings of SPIE - The International Society for Optical Engineering).

@inproceedings{75c12b1e46dc4800acea2fa04f609b6f,

title = "Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses",

abstract = "The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.",

keywords = "infrared, lithography, molding, nano lens, nano patterning, nano structure, soft, Silicon, Nanostructures, Nickel, Lithography, Platinum, Nanolithography, Polymers, Infrared lenses, Infrared radiation, Lenses",

author = "Park, \{Jae Hong\} and Jang, \{Hyun Ik\} and Park, \{Jun Yong\} and Jeon, \{Seok Woo\} and Kim, \{Woo Choong\} and Kim, \{Hee Yeoun\} and Ahn, \{Chi Won\}",

year = "2015",

month = mar,

doi = "10.1117/12.2080980",

language = "English",

isbn = "9781628415254",

volume = "9423",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

publisher = "SPIE",

editor = "Resnick, \{Douglas J.\} and Christopher Bencher",

booktitle = "Proceedings of SPIE",

address = "United States",

note = "Alternative Lithographic Technologies VII ; Conference date: 23-02-2015 Through 26-02-2015",

url = "https://spie.org/AL15/conferencedetails/alternative-lithographic-technologies",

}

Park, JH, Jang, HI, Park, JY, Jeon, SW, Kim, WC, Kim, HY & Ahn, CW 2015, Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses. in DJ Resnick & C Bencher (eds), Proceedings of SPIE: Alternative Lithographic Technologies VII. vol. 9423, 94231N, Proceedings of SPIE - The International Society for Optical Engineering, SPIE, Alternative Lithographic Technologies VII, San Jose, California, United States, 23/02/15. https://doi.org/10.1117/12.2080980

Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses. / Park, Jae Hong; Jang, Hyun Ik; Park, Jun Yong et al.
Proceedings of SPIE: Alternative Lithographic Technologies VII. ed. / Douglas J. Resnick; Christopher Bencher. Vol. 9423 SPIE, 2015. 94231N (Proceedings of SPIE - The International Society for Optical Engineering).

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

AU - Park, Jae Hong

AU - Jang, Hyun Ik

AU - Park, Jun Yong

AU - Jeon, Seok Woo

AU - Kim, Woo Choong

AU - Kim, Hee Yeoun

AU - Ahn, Chi Won

PY - 2015/3

Y1 - 2015/3

N2 - The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

AB - The methodology suggested in this research provides the great possibility of creating nanostructures composed of various materials, such as soft polymer, hard polymer, and metal, as well as Si. Such nanostructures are required for a vast range of optical and display devices, photonic components, physical devices, energy devices including electrodes of secondary batteries, fuel cells, solar cells, and energy harvesters, biological devices including biochips, biomimetic or biosimilar structured devices, and mechanical devices including micro- or nano-scale sensors and actuators.

KW - infrared

KW - lithography

KW - molding

KW - nano lens

KW - nano patterning

KW - nano structure

KW - soft

KW - Silicon

KW - Nanostructures

KW - Nickel

KW - Lithography

KW - Platinum

KW - Nanolithography

KW - Polymers

KW - Infrared lenses

KW - Infrared radiation

KW - Lenses

UR - https://www.scopus.com/pages/publications/84931332074

UR - https://www.scopus.com/pages/publications/84931332074#tab=impact

U2 - 10.1117/12.2080980

DO - 10.1117/12.2080980

M3 - RGC 32 - Refereed conference paper (with host publication)

SN - 9781628415254

VL - 9423

T3 - Proceedings of SPIE - The International Society for Optical Engineering

BT - Proceedings of SPIE

A2 - Resnick, Douglas J.

A2 - Bencher, Christopher

PB - SPIE

T2 - Alternative Lithographic Technologies VII

Y2 - 23 February 2015 through 26 February 2015

ER -

Park JH, Jang HI, Park JY, Jeon SW, Kim WC, Kim HY et al. Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses. In Resnick DJ, Bencher C, editors, Proceedings of SPIE: Alternative Lithographic Technologies VII. Vol. 9423. SPIE. 2015. 94231N. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2080980

Advanced nano lithography via soft materials-derived and reversible nano-patterning methodology for molding of infrared nano lenses

Abstract

Publication series

Conference

UN SDGs

Research Keywords

Access Output

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