Abridging the CMOS Technology II

Hei Wong

doi:10.3390/nano14110897

Abridging the CMOS Technology II

Hei Wong^*

^*Corresponding author for this work

Department of Electrical Engineering

Research output: Journal Publications and Reviews › Editorial Preface › peer-review

1 Citation (Scopus)

Original language	English
Article number	897
Journal	Nanomaterials
Volume	14
Issue number	11
Online published	21 May 2024
DOIs	https://doi.org/10.3390/nano14110897
Publication status	Published - Jun 2024

Funding

This work is supported by project#9231249 of the City University of Hong Kong, Hong Kong SAR, China.

Access Output

10.3390/nano14110897

Other Access Options

Check CityUHK Library

Permanent Link

Right click to copy link

Cite this

@article{ecf2e6698ff748ebaf9e0f3b12ec7611,

title = "Abridging the CMOS Technology II",

author = "Hei Wong",

year = "2024",

month = jun,

doi = "10.3390/nano14110897",

language = "English",

volume = "14",

journal = "Nanomaterials",

issn = "2079-4991",

publisher = "Multidisciplinary Digital Publishing Institute (MDPI)",

number = "11",

}

TY - JOUR

T1 - Abridging the CMOS Technology II

AU - Wong, Hei

PY - 2024/6

Y1 - 2024/6

UR - http://www.scopus.com/inward/record.url?scp=85195864701&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-85195864701&origin=recordpage

U2 - 10.3390/nano14110897

DO - 10.3390/nano14110897

M3 - Editorial Preface

AN - SCOPUS:85195864701

SN - 2079-4991

VL - 14

JO - Nanomaterials

JF - Nanomaterials

IS - 11

M1 - 897

ER -

Abridging the CMOS Technology II

Funding

Access Output

Other Access Options

Permanent Link

Other Files and Links

Cite this