A study of fundamental mechanisms of Si-B-N composite films deposited by duplex treatment

Chengbiao Wang, Xiang Yu, Junfeng Yu, Hua Meng

    Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

    5 Citations (Scopus)

    Abstract

    In this study, a new kind of Si-B-N composite film was deposited on 1045 steel with good adhesion by radio frequency-direct current-plasma enhanced chemical vapor deposition and then was analyzed by X-ray photoelectron spectroscopy and X-ray diffractometry. The results indicate that through the appropriate control of process parameters, especially applying a DC negative bias voltage to the substrate, the Si-B-N composite film with a mixed phase of h-BN and c-BN crystal is obtained. The film was produced by duplex treatment, and its performance was then evaluated. The effects of the applied negative bias on the BN content, adhesion strength, microhardness, and friction coefficient were also investigated. © 2003 Elsevier Science Ltd. All rights reserved.
    Original languageEnglish
    Pages (from-to)451-457
    JournalUser Modeling and User-Adapted Interaction
    Volume71
    Issue number4
    DOIs
    Publication statusPublished - 25 Jul 2003

    Research Keywords

    • Duplex treatment
    • Negative bias voltage
    • Si-B-N composite thin film
    • Tribological performance

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