A specially designed PLC-based high-voltage pulse modulator for plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Zongtao Zhu
  • Chunzhi Gong
  • Zhijian Wang
  • Xiubo Tian
  • Yi Li
  • Shiqin Yang
  • Ricky K. Y. Fu

Detail(s)

Original languageEnglish
Article number5504168
Pages (from-to)3083-3088
Journal / PublicationIEEE Transactions on Plasma Science
Volume38
Issue number11 PART 1
Publication statusPublished - Nov 2010

Abstract

A novel high-voltage pulse power system based on a programmable logic controller (PLC) is developed for plasma immersion ion implantation (PIII). The PLC unit with strong anti-interference ability is utilized to optimize both electrical parameters and ion-implantation processes with manual or/and procedure modes. Specially designed periphery circuits are developed to realize the arbitrary adjustment of pulsing frequency and width which is impossible for conventional PLC systems. The electrical protection can also work rapidly in the case of a sudden short circuit. In the main power circuit, a tetrode hard tube is employed to switch the dc high voltage. In order to reduce the rise time of the pulse as much as possible, the potentials on the tetrode grids are optimized. A closed-loop system is also designed to ensure implantation voltage not to depend on the plasma load during the PIII processes. With the help of numerical calculation or simulation, the expected ion energy-number spectrum can be easily obtained. © 2006 IEEE.

Research Area(s)

  • Ion implantation, plasma sheath, programmable logic controller (PLC), pulse modulator

Citation Format(s)

A specially designed PLC-based high-voltage pulse modulator for plasma immersion ion implantation. / Zhu, Zongtao; Gong, Chunzhi; Wang, Zhijian; Tian, Xiubo; Li, Yi; Yang, Shiqin; Fu, Ricky K. Y.; Chu, Paul K.

In: IEEE Transactions on Plasma Science, Vol. 38, No. 11 PART 1, 5504168, 11.2010, p. 3083-3088.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review