A Protocol For The Synthesis Of Bismuth Vanadate Double-Layer Homojunction Without Heteroatoms As Photoelectrode

Ruiqin ZHANG (Inventor), Haipeng WANG (Inventor)

Research output: Patents, Agreements and AssignmentsRGC 51 - Patents (CityUHK)

Translated title of the contribution一種不引入雜原子合成釩酸鉍雙層薄膜同質結構的方案
Original languageEnglish
Patent numberUS12,227,856B2
Publication statusPublished - 18 Feb 2025

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