A Novel High-Entropy Amorphous Thin Film with High Electrical Resistivity and Outstanding Corrosion Resistance

This study explores a novel WNbMoTaV high-entropy thin film (HETF) in amorphous structure via pulsed laser deposition system. The formation of amorphous structure of this high-entropy alloy is ascribed to the high cooling rate during the deposition process. The HETF shows a smooth surface with a height fluctuation of less than 13 nm. This film has a high electrical resistivity of ∼320.6 μΩ⋅cm and a low corrosion current density of 0.088 μA/cm². The corrosion resistance of the HETF at ambient temperature is superior to the conventional AISI 316L stainless steel. The high electrical resistivity and excellent corrosion resistance of the HETF are mainly attributed to its chemical disorder, cocktail effect and homogeneous amorphous structure. This experimental phenomenon not only provides a basis for the preparation of amorphous alloy films with low glass forming ability by pulsed laser deposition system, also promotes the potential application of WNbMoTaV HETF in the microelectronic components as resistivity sensors.