A New Approach to Current-Voltage Characteristics Formation for Short-Channel MOSFET’s
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
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Detail(s)
Original language | English |
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Pages (from-to) | 2480-2482 |
Journal / Publication | IEEE Transactions on Electron Devices |
Volume | 41 |
Issue number | 12 |
Publication status | Published - Dec 1994 |
Link(s)
Abstract
A new approach to the current-voltage (I-V) characteristics formulation for short-channel MOSFET’s by incorporating the channel length modulation, mobility degradation, drain induced barrier lowering, and threshold voltage variation into Pao-Sah’s equation is presented. Results show that the calculated I-V characteristics agree well with the experimental ones for devices with effective channel length in the range of 0.44 ~ 20 µm. Compared with the existing models, the model has the advantages of less number of model parameters and simpler form of the current-voltage relationship. © 1994 IEEE
Citation Format(s)
A New Approach to Current-Voltage Characteristics Formation for Short-Channel MOSFET’s. / Wong, H.
In: IEEE Transactions on Electron Devices, Vol. 41, No. 12, 12.1994, p. 2480-2482.
In: IEEE Transactions on Electron Devices, Vol. 41, No. 12, 12.1994, p. 2480-2482.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review