A nanoindentation study of thick cBN films prepared by chemical vapor deposition

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)438-444
Journal / PublicationJournal of Crystal Growth
Volume247
Issue number3-4
Publication statusPublished - Jan 2003

Abstract

The mechanical properties of high-quality cubic boron nitride (cBN) films were systematically investigated by nanoindentation measurements performed in both cross-sectional and plan-view directions. The large film thickness (∼5μm) allows the effective ruling out of both substrate and indenter size effects. The hardness and elastic modulus values were found to be 70 and 800 GPa, respectively, which are the highest values ever obtained on cBN films deposited by either PVD or CVD methods so far (comparable to those reported for cBN crystals synthesized by high-pressure high-temperature methods). The variation of hardness across the cBN film thickness was investigated. In conjunction with the transmission electron microscopic observations, the relationship of the hardness measured with the crystallinity and crystal size/grain boundaries was discussed. © 2002 Elsevier Science B.V. All rights reserved.

Research Area(s)

  • A1. Mechanical properties testing, A1. Nanoindentation, A3. Chemical vapor deposition processes, B1. Nitrides, B2. Superhard materials

Citation Format(s)

A nanoindentation study of thick cBN films prepared by chemical vapor deposition. / Chan, C. Y.; Zhang, W. J.; Matsumoto, S. et al.
In: Journal of Crystal Growth, Vol. 247, No. 3-4, 01.2003, p. 438-444.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review