A nanoindentation study of thick cBN films prepared by chemical vapor deposition

C. Y. Chan; W. J. Zhang; S. Matsumoto; I. Bello; S. T. Lee

doi:10.1016/S0022-0248(02)02039-0

Author(s)

C. Y. Chan
W. J. Zhang
S. Matsumoto
I. Bello
S. T. Lee

Related Research Unit(s)

Centre of Super-Diamond and Advanced Films

Detail(s)

Original language	English
Pages (from-to)	438-444
Journal / Publication	Journal of Crystal Growth
Volume	247
Issue number	3-4
Publication status	Published - Jan 2003

Link(s)

DOI	DOI https://doi.org/10.1016/S0022-0248(02)02039-0 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-0037212073&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(f29e8526-c9fd-481e-898a-cf2ef416e204).html

Abstract

The mechanical properties of high-quality cubic boron nitride (cBN) films were systematically investigated by nanoindentation measurements performed in both cross-sectional and plan-view directions. The large film thickness (∼5μm) allows the effective ruling out of both substrate and indenter size effects. The hardness and elastic modulus values were found to be 70 and 800 GPa, respectively, which are the highest values ever obtained on cBN films deposited by either PVD or CVD methods so far (comparable to those reported for cBN crystals synthesized by high-pressure high-temperature methods). The variation of hardness across the cBN film thickness was investigated. In conjunction with the transmission electron microscopic observations, the relationship of the hardness measured with the crystallinity and crystal size/grain boundaries was discussed. © 2002 Elsevier Science B.V. All rights reserved.

Research Area(s)

A1. Mechanical properties testing, A1. Nanoindentation, A3. Chemical vapor deposition processes, B1. Nitrides, B2. Superhard materials

Citation Format(s)

[ RIS ] [ BibTeX ]

A nanoindentation study of thick cBN films prepared by chemical vapor deposition. / Chan, C. Y.; Zhang, W. J.; Matsumoto, S. et al.

In: Journal of Crystal Growth, Vol. 247, No. 3-4, 01.2003, p. 438-444.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Chan, CY, Zhang, WJ, Matsumoto, S, Bello, I & Lee, ST 2003, 'A nanoindentation study of thick cBN films prepared by chemical vapor deposition', Journal of Crystal Growth, vol. 247, no. 3-4, pp. 438-444. https://doi.org/10.1016/S0022-0248(02)02039-0

Chan, C. Y., Zhang, W. J., Matsumoto, S., Bello, I., & Lee, S. T. (2003). A nanoindentation study of thick cBN films prepared by chemical vapor deposition. Journal of Crystal Growth, 247(3-4), 438-444. https://doi.org/10.1016/S0022-0248(02)02039-0

Chan CY, Zhang WJ, Matsumoto S, Bello I, Lee ST. A nanoindentation study of thick cBN films prepared by chemical vapor deposition. Journal of Crystal Growth. 2003 Jan;247(3-4):438-444. doi: 10.1016/S0022-0248(02)02039-0

Chan, C. Y. ; Zhang, W. J. ; Matsumoto, S. et al. / A nanoindentation study of thick cBN films prepared by chemical vapor deposition. In: Journal of Crystal Growth. 2003 ; Vol. 247, No. 3-4. pp. 438-444.