TY - JOUR
T1 - A nanoindentation study of thick cBN films prepared by chemical vapor deposition
AU - Chan, C. Y.
AU - Zhang, W. J.
AU - Matsumoto, S.
AU - Bello, I.
AU - Lee, S. T.
PY - 2003/1
Y1 - 2003/1
N2 - The mechanical properties of high-quality cubic boron nitride (cBN) films were systematically investigated by nanoindentation measurements performed in both cross-sectional and plan-view directions. The large film thickness (∼5μm) allows the effective ruling out of both substrate and indenter size effects. The hardness and elastic modulus values were found to be 70 and 800 GPa, respectively, which are the highest values ever obtained on cBN films deposited by either PVD or CVD methods so far (comparable to those reported for cBN crystals synthesized by high-pressure high-temperature methods). The variation of hardness across the cBN film thickness was investigated. In conjunction with the transmission electron microscopic observations, the relationship of the hardness measured with the crystallinity and crystal size/grain boundaries was discussed. © 2002 Elsevier Science B.V. All rights reserved.
AB - The mechanical properties of high-quality cubic boron nitride (cBN) films were systematically investigated by nanoindentation measurements performed in both cross-sectional and plan-view directions. The large film thickness (∼5μm) allows the effective ruling out of both substrate and indenter size effects. The hardness and elastic modulus values were found to be 70 and 800 GPa, respectively, which are the highest values ever obtained on cBN films deposited by either PVD or CVD methods so far (comparable to those reported for cBN crystals synthesized by high-pressure high-temperature methods). The variation of hardness across the cBN film thickness was investigated. In conjunction with the transmission electron microscopic observations, the relationship of the hardness measured with the crystallinity and crystal size/grain boundaries was discussed. © 2002 Elsevier Science B.V. All rights reserved.
KW - A1. Mechanical properties testing
KW - A1. Nanoindentation
KW - A3. Chemical vapor deposition processes
KW - B1. Nitrides
KW - B2. Superhard materials
UR - http://www.scopus.com/inward/record.url?scp=0037212073&partnerID=8YFLogxK
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0037212073&origin=recordpage
U2 - 10.1016/S0022-0248(02)02039-0
DO - 10.1016/S0022-0248(02)02039-0
M3 - RGC 21 - Publication in refereed journal
SN - 0022-0248
VL - 247
SP - 438
EP - 444
JO - Journal of Crystal Growth
JF - Journal of Crystal Growth
IS - 3-4
ER -