A chemical approach to 3-D lithographic patterning of Si and Ge nanocrystals
- I. D. Sharp
- , Q. Xu
- , D. O. Yi
- , C. Y. Liao
- , J. W. Ager III
- , J. W. Beeman
- , K. M. Yu
- , J. T. Robinson
- , O. D. Dubón
- , D. C. Chrzan
- , E. E. Haller
Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review