4H-SiC Metal-Semiconductor-Metal Ultraviolet Photodetectors in Operation of 450 °c

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

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Author(s)

  • Wei-Cheng Lien
  • Dung-Sheng Tsai
  • Der-Hsien Lien
  • Debbie G. Senesky
  • Albert P. Pisano

Detail(s)

Original languageEnglish
Article number6329395
Pages (from-to)1586-1588
Journal / PublicationIEEE Electron Device Letters
Volume33
Issue number11
Online published11 Oct 2012
Publication statusPublished - Nov 2012
Externally publishedYes

Abstract

This work demonstrates the high-temperature operation of metal-semiconductor-metal (MSM) photodetectors (PDs) up to 450 °C using lightly Al-doped epitaxial 4H-SiC thin films. The responsivity of the PDs under 325-nm illumination is 0.0305 A/W at 20-V bias at room temperature. The photocurrent-to-dark-current ratio of the SiC MSM PDs is as high as 1.3 ×105 at 25 °C and is 0.62 at 450 °C. The rise/fall time of the PDs is increased slightly from 594 μs/684 μs to 684 μs/786 μs as the temperature increases from room temperature to 400 °C. These results support the use of 4H-SiC PDs in extremely high temperature applications.

Research Area(s)

  • High-temperature electronics, photodetectors (PDs), silicon carbide (SiC)

Citation Format(s)

4H-SiC Metal-Semiconductor-Metal Ultraviolet Photodetectors in Operation of 450 °c. / Lien, Wei-Cheng; Tsai, Dung-Sheng; Lien, Der-Hsien et al.
In: IEEE Electron Device Letters, Vol. 33, No. 11, 6329395, 11.2012, p. 1586-1588.

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review