TY - JOUR
T1 - 2D WS2
T2 - From Vapor Phase Synthesis to Device Applications
AU - Lan, Changyong
AU - Li, Chun
AU - Ho, Johnny C.
AU - Liu, Yong
PY - 2021/7
Y1 - 2021/7
N2 - The discovery of graphene has triggered the research on 2D layer structured materials. Among many 2D materials, semiconducting transition metal dichalcogenides (TMDs) are widely considered to be the most promising ones due to their excellent electrical and optoelectronic characteristics. Tungsten disulfide (WS2) is a kind of such TMDs with fascinating properties, such as the high carrier mobility, appropriate band gap, strong light–matter interaction with the large light absorption coefficient, very large exciton binding energy, large spin splitting, and polarized light emission. All these interesting properties can make the 2D WS2 being highly favorable for applications in memristors, light-emitting devices, optical modulators, and many others. Here, the comprehensive review on the properties, vapor phase synthesis, electronic and optoelectronic applications of 2D WS2 is presented. This review does not only serve as a design guideline to elevate the material quality of 2D WS2 films via enhanced synthesis approaches, but also provides valuable insights to various strategies to improve their device performances. With the fast development of wafer-scale synthesis methods and novel device structures, 2D WS2 can undoubtedly be a rising star for the next-generation devices in the near future.
AB - The discovery of graphene has triggered the research on 2D layer structured materials. Among many 2D materials, semiconducting transition metal dichalcogenides (TMDs) are widely considered to be the most promising ones due to their excellent electrical and optoelectronic characteristics. Tungsten disulfide (WS2) is a kind of such TMDs with fascinating properties, such as the high carrier mobility, appropriate band gap, strong light–matter interaction with the large light absorption coefficient, very large exciton binding energy, large spin splitting, and polarized light emission. All these interesting properties can make the 2D WS2 being highly favorable for applications in memristors, light-emitting devices, optical modulators, and many others. Here, the comprehensive review on the properties, vapor phase synthesis, electronic and optoelectronic applications of 2D WS2 is presented. This review does not only serve as a design guideline to elevate the material quality of 2D WS2 films via enhanced synthesis approaches, but also provides valuable insights to various strategies to improve their device performances. With the fast development of wafer-scale synthesis methods and novel device structures, 2D WS2 can undoubtedly be a rising star for the next-generation devices in the near future.
KW - chemical vapor deposition
KW - electronics
KW - optoelectronics
KW - synthesis
KW - WS2
KW - FIELD-EFFECT TRANSISTOR
KW - TRANSITION-METAL DISULFIDES
KW - QUALITY MONOLAYER WS2
KW - LARGE-AREA SYNTHESIS
KW - WAFER-SCALE
KW - TUNGSTEN DISULFIDE
KW - SINGLE-LAYER
KW - SATURABLE ABSORBER
KW - 2-DIMENSIONAL MATERIALS
KW - DEPOSITION GROWTH
KW - chemical vapor deposition
KW - electronics
KW - optoelectronics
KW - synthesis
KW - WS2
KW - FIELD-EFFECT TRANSISTOR
KW - TRANSITION-METAL DISULFIDES
KW - QUALITY MONOLAYER WS2
KW - LARGE-AREA SYNTHESIS
KW - WAFER-SCALE
KW - TUNGSTEN DISULFIDE
KW - SINGLE-LAYER
KW - SATURABLE ABSORBER
KW - 2-DIMENSIONAL MATERIALS
KW - DEPOSITION GROWTH
KW - chemical vapor deposition
KW - electronics
KW - optoelectronics
KW - synthesis
KW - WS2
KW - FIELD-EFFECT TRANSISTOR
KW - TRANSITION-METAL DISULFIDES
KW - QUALITY MONOLAYER WS2
KW - LARGE-AREA SYNTHESIS
KW - WAFER-SCALE
KW - TUNGSTEN DISULFIDE
KW - SINGLE-LAYER
KW - SATURABLE ABSORBER
KW - 2-DIMENSIONAL MATERIALS
KW - DEPOSITION GROWTH
UR - https://www.scopus.com/pages/publications/85090789824
UR - http://gateway.isiknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=LinksAMR&SrcApp=PARTNER_APP&DestLinkType=FullRecord&DestApp=WOS&KeyUT=000567841500001
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-85090789824&origin=recordpage
U2 - 10.1002/aelm.202000688
DO - 10.1002/aelm.202000688
M3 - RGC 21 - Publication in refereed journal
SN - 2199-160X
VL - 7
JO - Advanced Electronic Materials
JF - Advanced Electronic Materials
IS - 7
M1 - 2000688
ER -