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金属薄膜电阻率与表面粗糙度、残余应力的关系

Translated title of the contribution: Relationship between resistivity of metallic film and its surface roughness, residual stress

唐武 *, 邓龙江, 徐可为, Jian Lu

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Au film was fabricated on Al2O3 substrate by magnetron sputtering. The relationship between resistivity of metallic film and its surface roughness, residual stress was investigated according to experimental results. The results show that the resistivity of the metallic film correlates with surface roughness and residual stress. The increase of resistivity with surface roughness and tensile residual stress can be explained by the strain energy theory. It can be inferred that crystal orientation may be connect with the mechanical behavior and functional property of metallic film.
Translated title of the contributionRelationship between resistivity of metallic film and its surface roughness, residual stress
Original languageChinese (Simplified)
Pages (from-to)617-620
Journal稀有金属材料与工程
Volume37
Issue number4
Publication statusPublished - Apr 2008
Externally publishedYes

Research Keywords

  • 金属薄膜
  • 电阻率
  • 表面粗糙度
  • 残余应力
  • Metallic film
  • Resistivity
  • Surface roughness
  • Residual stress

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