Abstract
Plasma immersion ion implantation (PIII) is an effective surface modification tool. During PIII processes, the objects to be treated are immersed in plasmas and then biased to negative potential. Consequently the plasma sheath forms and ion implantation may be performed. The pre-requirement of plasma implantation is that the object is conductive. So it seems difficult to treat the insulating materials. The paper focuses on the possibilities of plasma implantation into insulating materials and presents some examples.
| Translated title of the contribution | Plasma immersion ion implantation into insulating materials |
|---|---|
| Original language | Chinese (Simplified) |
| Pages (from-to) | 335-338 |
| Journal | 核技术 |
| Volume | 29 |
| Issue number | 5 |
| Publication status | Published - May 2006 |
Research Keywords
- 等离子体离子注入
- 绝缘材料
- 鞘层
- 表面充电
- Plasma ion implantation
- Insulating materials
- Plasma sheath
- Surface charging
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